A Comparison of Parallel and Perpendicular Wave Propagations at Low and High Frequencies in Magnetized Plasma
Natnael Abeje Gebeyehu
Corresponding Author : Natnael Abeje Gebeyehu
Department of Physics, College of Natural and Computational Science, Wolaita Sodo University, P.O.Box: 138, Wolaita Sodo, Ethiopia
Email ID : firstname.lastname@example.org
Received : 2018-09-02 Accepted : 2018-10-25 Published : 2018-10-25
Abstract : Plasma Waves may propagate in different frequency levels. This study justifies the reason for the difference in dispersion curve at low and high frequencies of plasma wave propagations. At low frequencies i.e. ( ω≪Ω_i ), the right handed and the left handed waves tend to the Alfven wave. The fast and slow Alfvén waves are indistinguishable for parallel propagation whereas the shear-Alfvén wave does not propagate perpendicular to the magnetic field. At high-frequency the right-handed waves, propagating parallel to the equilibrium magnetic field, and oscillating at the frequency Ω_e are absorbed by electrons. By this paper it is proved that the low-frequency branch of the dispersion curve differs fundamentally from the high-frequency branch, because the former branch corresponds to a wave which can only propagate through the plasma in the presence of an equilibrium magnetic field, whereas the high-frequency branch corresponds to a wave which can propagate in the absence of an equilibrium field.
Keywords : wave propagation, Alfven wave, magnetized plasma, frequency
Citation : Natnael Abeje (2018). A Comparison of Parallel and Perpendicular Wave Propagations at Low and High Frequencies in Magnetized Plasma. J. of Physical and Chemical Sciences. V6I4:01 DOI : 10.5281/zenodo.1480415
Copyright : © 2018 XXXX. This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.
Journal of Physical and Chemical Sciences
ISSN : 2348-327X
Volume 6 / Issue 4
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